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Self-developed high-end optical coating equipment with 1200mm*500mm(customized)
Working principle
Atomiclayer deposition (ALD) is a method by which a substance can be deposited on a substrate layer by layer in the form of a single atomic film.
Specification parameter
| model | ALD1200-500 |
| Coating film system | AL2O3,TiO2,ZnO and etc. |
| Coating temperature range | Normal temperature-500℃ |
| Coating vacuum chamber dimensions | Inner diameter 1200mm, height 500mm(customizable) |
| Vacuum chamber structure | Customized according to customer needs |
| Background vacuum | <5X10-7mbar |
| Coating thickness | ≥0.15nm |
| Thickness control accuracy | ±0.Inm |
Application Area
| MEMS device |
| Electroluminescent plate |
| display |
| Storage material |
| Inductive coupling |
| Perovskite thin film battery |
| 3D packaging |
| Luminescence application |
| sensor |
| Carp battery |
ALD technology Advantages
①The precursor is saturated chemisorption, which ensures the formation of a large area uniform film.
②Multi-component nanosheets and mixed oxides can be deposited.
③Inherent deposition uniformity, easy scaling, can be directly scaled up.
④Can be widely applied to various shapes of the base.