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Surface Defect Detector in Integrated Circuit Chip Industry
Applications
For the process control and yield management of blank mask in the fields of integrated circuit chip manufacturing,
we can help glass substrate and mask manufacturers to identify and monitor the mask defects, reduce the risk of
yield and improve their independent ability of R&D for core technologies.
Working Principle
The defects on the mask surface can be automatically detected from three aspects: optics system performance,
camera performance and motion platform performance.
Features
| Model | SDD-ICC-X—X | |
| Performance detection | Detectable defect type | Scratches, Dusts |
| Detectable defect size | 1μm | |
| Detection accuracy (measured) | 100% detection of defects / collection of defects (scratches, dust) | |
| Detection efficiency | ≤10 minutes ( Measured value : 350mm x 300mm Mask) | |
| Optical System Performance | Resolution | 1.8μm |
| Magnification | 40x | |
| Field of view | 0.5mm x 0.5mm | |
| Blue light illumination | 460nm, 2.5w | |
|
Motion Platform Performance
| X, Y two-axis motion Marble countertop flatness: 2.5μm Y-axis Z-direction runout precision: ≤ 10.5μm Y-axis Z-direction runout precision: ≤8.5μm | |
| Note: Customized production available. | ||
Detection Images
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