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Blank Mask Substrate Surface defect detector
Applications
For the process control and yield management of blank mask substrate manufacturing, we can help manufacturers
to identify and monitor the mask defects, reduce the risk of yield and improve their independent ability of R&D for
core technologies.
Working Principle
The defects on the blank mask surface can be detected automatically based on visual information acquisition,
underlying logic algorithm and actual needs.
Features
| Model | SDD-BM-X—X | |
| Performance detection | Detectable defect type | Scratches, Dusts |
| Detectable defect size | 1μm | |
| Detection accuracy (measured) | 100% detection of defects / collection of defects (scratches, dust) | |
| Detection efficiency | ≤10 minutes ( Measured value : 350mm x 300mm Mask) | |
| Optical System Performance | Resolution | 1.8μm |
| Magnification | 40x | |
| Field of view | 0.5mm x 0.5mm | |
| Blue light illumination | 460nm, 2.5w | |
|
Motion Platform Performance
| X, Y two-axis motion Marble countertop flatness: 2.5μm Y-axis Z-direction runout precision: ≤ 10.5μm Y-axis Z-direction runout precision: ≤8.5μm | |
| Note: Customized production available. | ||
Detection Images
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