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152×152mm FPD Photomask Substrate For Micro Nano Fabrication

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ZEIT Group
City:chengdu
Province/State:sichuan
Country/Region:china
Contact Person:MsTyra
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152×152mm FPD Photomask Substrate For Micro Nano Fabrication

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Brand Name :ZEIT
Model Number :6 inches
Certification :Case by case
Place of Origin :Chengdu, P.R.CHINA
MOQ :1pcs
Price :Case by case
Payment Terms :T/T
Supply Ability :Case by case
Delivery Time :Case by case
Packaging Details :Wooden case
Material :Quartz
Shipping Terms :FEDEX, DHL, EMS, TNT, etc
Model :6 inches
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View Product Description

152mm × 152mm Quartz For FPD Use

Applications

The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display),

MEMS (Micro Electro Mechanical Systems), etc.

Working Principle

Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure

is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the

product substrate through an exposure process.

Features

for FPD use

Model / Material Size Processing Capacity
6 inches / Quartz 152mm × 152mm Grinding, Polishing, Chrome Plating, Gluing

Process Flow

→ Raw materials detection;

→ Rough grinding;

→ Rough polishing;

→ Mask cleaning;

→ Raw materials performance inspection;

→ Plated by chrome;

→ Mask performance testing;

→ Photoresist coating;

→ Packaging;

→ Transporting.

Our Advantages

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Mature process.

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152×152mm FPD Photomask Substrate For Micro Nano Fabrication

Parts Of Our Patents

152×152mm FPD Photomask Substrate For Micro Nano Fabrication152×152mm FPD Photomask Substrate For Micro Nano Fabrication

Parts Of Our Awards and Qualifications of R&D

152×152mm FPD Photomask Substrate For Micro Nano Fabrication152×152mm FPD Photomask Substrate For Micro Nano Fabrication

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